APPLICATION OF A MICROMACHINE SCANNING TUNNELING MICROSCOPE (MU-STM) FOR VACUUM TUNNELING GAP OBSERVATION

Citation
Mi. Lutwyche et Y. Wada, APPLICATION OF A MICROMACHINE SCANNING TUNNELING MICROSCOPE (MU-STM) FOR VACUUM TUNNELING GAP OBSERVATION, Journal of Electron Microscopy, 46(2), 1997, pp. 161-164
Citations number
12
Categorie Soggetti
Microscopy
ISSN journal
00220744
Volume
46
Issue
2
Year of publication
1997
Pages
161 - 164
Database
ISI
SICI code
0022-0744(1997)46:2<161:AOAMST>2.0.ZU;2-X
Abstract
This paper reports the observation of the vacuum tunnelling gap betwee n two conductors of a scanning tunnelling microscope (STM), using a hi gh-resolution transmission electron microscope (TEM). A micromachine s canning tunnelling microscope (mu-STM) is made on a 2.5 mm(2) chip, by an advanced ultra-large scale integrated circuit (ULSI) technology wi th a minimum dimension of 0.4 mu m and alignment accuracy of 0.1 mu m. The mu-STM is designed to fit into a TEM sample holder for direct obs ervation of the tip apex, and the results demonstrate the possibility of analysing the tunnelling gap physics and material transport mechani sms at the tip apex.