Our current understanding of the relationship between interfacial structure
and the resulting properties remains very rudimentary. This is a concern f
or many fields and applications, including metal/semiconductor contacts, in
sulator/semiconductor field effect junctions, magnetic multilayers, ferroel
ectric thin films, and semiconductor heterostructures. The situation is sli
ghtly improved in the case of epitaxial growth where a deposited layer foll
ows the structure of the underlying substrate. However, even with these sys
tems the interfacial properties are difficult to predict accurately, even w
hen impurities and defects can be ignored. This paper highlights a number o
f recent examples of interface structure-property investigations that have
attempted to understand how the interface formation determines the relevant
film or interface property.