Thin heteroepitaxial layers of In0.8Al0.2As grown on InAs surfaces by molec
ular beam epitaxy can reduce the density of surface states which pin the Fe
rmi level and cause surface accumulation. Biased capacitance-voltage and ga
ted Hall measurements indicate that InAs surfaces can be driven through the
flat-band into depletion with the density of surface states. reduced to si
milar to 1.5 x 10(12)cm(-2) eV(-1) below the Fermi level.