A two-stage reduction process for silicon production

Citation
M. Tada et M. Hirasawa, A two-stage reduction process for silicon production, HIGH TEMP M, 19(3-4), 2000, pp. 281-297
Citations number
13
Categorie Soggetti
Material Science & Engineering
Journal title
HIGH TEMPERATURE MATERIALS AND PROCESSES
ISSN journal
03346455 → ACNP
Volume
19
Issue
3-4
Year of publication
2000
Pages
281 - 297
Database
ISI
SICI code
0334-6455(200003)19:3-4<281:ATRPFS>2.0.ZU;2-H
Abstract
A new "Two-Stage Reduction Process" is proposed for the production of high purity silicon. The porous SiC separates molten SiO2 from an evacuated cham ber. In the first stage, the molten SiO2 reacts with SIC to produce gaseous SiO. In the second stage, SiO is sucked through the porous SIC wall and is reduced to Si. The fundamental potential of this process is examined by ex periments and theoretical considerations. The conditions for the formation of Si are investigated. The Si formation rate and the rate controlling step s of this process are discussed on the basis of the kinetic theory.