Correlation of magnetic and microstructural properties of obliquely deposited Co/Cr thin films

Single layers of Si(111)/Co(200 Angstrom)/Ag(30 Angstrom) and trilayers of Si(111)/Co(200 Angstrom)/Cr(15 Angstrom)Co(200 Angstrom)/Ag(30 Angstrom) we re deposited. using e-beam evaporation, at oblique angles of incidence to t he sample normal(in particular 0 degrees, 35 degrees, 40 degrees, 70 degree s). The magnetic properties of the samples were studied using the technique of ferromagnetic resonance, while the microstructure was imaged using high resolution electron microscopy. We find that the angle of deposition of Co has a critical effect on the magnetic anisotropy of the samples, and on th e interlayer coupling strength between the ferromagnetic layers of the tril ayer samples. It is shown that these effects are due to the microstructure of the samples which is controlled by the angle of Co deposition with respe ct to the sample normal. (C) 2000 Published by Elsevier Science B.V. All ri ghts reserved.