Hf-Si binary phase diagram determination and thermodynamic modeling

Citation
Jc. Zhao et al., Hf-Si binary phase diagram determination and thermodynamic modeling, J PH EQUIL, 21(1), 2000, pp. 40-45
Citations number
28
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHASE EQUILIBRIA
ISSN journal
10549714 → ACNP
Volume
21
Issue
1
Year of publication
2000
Pages
40 - 45
Database
ISI
SICI code
1054-9714(200002)21:1<40:HBPDDA>2.0.ZU;2-Z
Abstract
A new version of the Hf-Si binary phase diagram has been constructed and it includes recent confirmation of the existence of the Hf5Si3 phase and obse rvation of the following eutectoid reaction: Hf5Si3 <-> Hf2Si + Hf3Si2 at 1 925 +/- 25 degrees C, The peritectic reaction, L + Hf3Si2 <-> Hf5Si3 at sim ilar to 2360 +/- 30 degrees C, was proposed with consideration of Brukl's i ncipient melting results. Thermodynamic modeling of the binary Hf-Si system was performed via Thermo-Gale with existing phase diagram data, the experi mental results described in this paper, and the reported enthalpies of form ation for Hf silicides, A complete thermodynamic description of the Gibbs e nergies of all stable phases in the binary system was developed and was con sistent with the majority of the phase diagram and thermochemistry data.