SiGe CMOS fabrication using SiGe MBE and anodic/LTO gate oxide (vol 15, pg135, 2000)

Sidek, RM Straube, UN Waite, AM Evans, AGR Parry, C Phillips, P Whall, TE Parker, EHC Riley, LS Hall, S

Rm. Sidek et al., SiGe CMOS fabrication using SiGe MBE and anodic/LTO gate oxide (vol 15, pg135, 2000), SEMIC SCI T, 15(4), 2000, pp. 423-423

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Apllied Physucs/Condensed Matter/Materiales Science

SEMICONDUCTOR SCIENCE AND TECHNOLOGY

02681242 → ACNP

15

4

2000

423 - 423

ISI

0268-1242(200004)15:4<423:SCFUSM>2.0.ZU;2-4