Carbon dependence of the dielectric response function in epitaxial SiGeC layers grown on Si

Citation
J. Bonan et al., Carbon dependence of the dielectric response function in epitaxial SiGeC layers grown on Si, THIN SOL FI, 364(1-2), 2000, pp. 53-57
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
364
Issue
1-2
Year of publication
2000
Pages
53 - 57
Database
ISI
SICI code
0040-6090(20000327)364:1-2<53:CDOTDR>2.0.ZU;2-2
Abstract
The influence of carbon on optical transitions in SiGeC layers grown pseudo morphically on Si(100) substrate by rapid thermal chemical vapor deposition was investigated. We used spectroscopic ellipsometry to extract the pseudo dielectric function for two sets of layers, with Ge-content of 8 and 18% an d with C-content between 0 and 1.8%. From the numerical derivatives of the measured dielectric functions, we determined the critical point energies E- 1, E-1 + Delta(1), and E-2 as a function of the C-content. A weak linear de pendence on the C-content was observed for all transitions. The experimenta l results could not be described either by considering solely the alloying effect, nor by linear addition of the strain-induced contributions. For a c omplete description of the observed energy shifts, a detailed band structur e calculations and further experimental data are necessary. (C) 2000 Elsevi er Science S.A. All rights reserved.