Analysis of III-V layer stacks on INP substrates using spectroscopic ellipsometry in the NIR spectral range

Citation
Hg. Bukkems et al., Analysis of III-V layer stacks on INP substrates using spectroscopic ellipsometry in the NIR spectral range, THIN SOL FI, 364(1-2), 2000, pp. 165-170
Citations number
9
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
THIN SOLID FILMS
ISSN journal
00406090 → ACNP
Volume
364
Issue
1-2
Year of publication
2000
Pages
165 - 170
Database
ISI
SICI code
0040-6090(20000327)364:1-2<165:AOILSO>2.0.ZU;2-2
Abstract
Thickness and complex refractive index of each layer in a double hetero str ucture, consisting of InP and InGaAsP, are obtained by spectroscopic ellips ometry. Accuracy is at least 2% in layer thickness and 0.005 in the refract ive index of InP. An equation description of the complex refractive index a llows for flexible description of InP-based materials in the wavelength ran ge of 800-1700 nm. Simultaneous determination of thickness and refractive i ndex by non-destructive ellipsometry in the near infra red (NIR) for the la yers in a double hetero layer stack requires additional information on the properties of these layers (C) 2000 Elsevier Science S.A. All rights reserv ed.