Different alleging behaviors of Co-Mo multilayered films upon ion irradiation and thermal annealing

Citation
C. Lin et al., Different alleging behaviors of Co-Mo multilayered films upon ion irradiation and thermal annealing, APPL PHYS A, 70(4), 2000, pp. 469-473
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
ISSN journal
09478396 → ACNP
Volume
70
Issue
4
Year of publication
2000
Pages
469 - 473
Database
ISI
SICI code
0947-8396(200004)70:4<469:DABOCM>2.0.ZU;2-C
Abstract
The Co-Mo system is characterized by a small negative heat of formation bei ng -7 kJ/mol, which provides a small driving force for alloying. In the cas e of the initial multilayered films with closest-packed semi-coherent inter faces, solid-state interfacial reaction is frustrated upon thermal annealin g even at a temperature up to 600 degrees C. However, amorphization through interfacial reaction was achieved upon ion irradiation as the intensive io n irradiation can elevate the initial energetic state by the irradiation en ergy as well as destroy the semi-coherent interfaces and thus drive atomic mixing in the films eventually becoming disordered.