The electron swarm growth processes in SF6-Ar gas mixtures have been studie
d by a pulsed Townsend method over the range 32.24 less than or equal to E/
N less than or equal to 564.2 Td (1Td = 10(-21)V.m(2)); where E is the elec
tric field and N is the gas density of the mixture. The variation patterns
as functions of the density-reduced electric field of the effective ionizat
ion coefficient <(alpha)over bar>, electron drift velocity V-e and longitud
inal diffusion coefficient D-L in SF6-Ar gas mixtures have been given. The
dielectric strength of SF6-Ar gas mixtures has also been determined, and fo
und to vary linearly with SF6 concentration in the gas mixtures.