Direct nanomolding of semiconductor single crystals

An ordered array of concaves of nanometer-scale dimensions was fabricated b y a direct molding process on an InP single crystal using a SiC master mold . The obtained array of concaves could be applied for the preparation of an ordered textured surface of InP by a post-etching treatment. The treatment in hydrofluoric acid (HF) solution generated a highly ordered and textured surface composed of uniform pyramidal or triangular pits. The mold could b e used repeatedly, and this method enables simple maskless patterning of se miconductor single crystals.