Several InGaAs-InAlAs multiple quantum-well structures grown by metalorgani
c vapor phase epitaxy (MOVPE), with various Ga content and quantum-well wid
th, have been investigated for electroabsorption modulators (EAM's). The li
ght-hole heavy-hole splitting, the chirp parameter, the insertion loss and
the figure of merit Gamma Delta alpha/F of the different InGaAs-InAlAs stru
ctures have been evaluated with photocurrent, photoluminescence, absorption
and X-ray measurements, It was then possible to experimentally study the i
nfluence of different parameters of the multiple quantum-well structures on
the device performance. The use of tensile strained barriers are believed
to be responsible for the improvement in the figure of merit, Structures wi
th unresolved light-hole and heavy-hole transitions, with negligible chirp,
with adequate insertion loss and with extremely high values for Gamma Delt
a alpha/F have been obtained, however, not simultaneously.