Real time resistometric depth monitoring in the focused ion beam

Authors
Latif, A Booij, WE Durrell, JH Blamire, MG
Citation
A. Latif et al., Real time resistometric depth monitoring in the focused ion beam, J VAC SCI B, 18(2), 2000, pp. 761-764
Citations number
5
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
2
Year of publication
2000
Pages
761 - 764
Database
ISI
SICI code
1071-1023(200003/04)18:2<761:RTRDMI>2.0.ZU;2-B
Abstract
We have developed an in situ focused ion beam measurement technique, which has applications for the accurate, controlled, and reproducible removal of material for high aspect ratio nanometer scale cuts in tracks. This techniq ue uses the resistance change of a track, as it is milled by ions, to monit or in real time the thickness and the end point. We have compared this tech nique with the thickness measurements by atomic force microscope for 1 mu m wide cuts. The technique has an accuracy of a few nanometers. (C) 2000 Ame rican Vacuum Society. [S0734-211X(00)02802-X].