Aligned carbon nanotube films for cold cathode applications

Citation
An. Obraztsov et al., Aligned carbon nanotube films for cold cathode applications, J VAC SCI B, 18(2), 2000, pp. 1059-1063
Citations number
19
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN journal
10711023 → ACNP
Volume
18
Issue
2
Year of publication
2000
Pages
1059 - 1063
Database
ISI
SICI code
1071-1023(200003/04)18:2<1059:ACNFFC>2.0.ZU;2-P
Abstract
Thin film material of oriented multiwall carbon nanotubes was obtained by n oncatalytical chemical vapor deposition in a glow-discharge plasma. The fil m phase composition, surface morphology, and structural features were studi ed by Raman and electron microscopy techniques. Low-voltage electron field emission of thin film nanotube material was obtained and examined in diode configuration. The I-V curves in Fowler-Nordheim coordinates were linear an d the corresponding threshold average field was about 1.5 V/mu m. The emiss ion current density was up to 50 mA/cm(2) at the field of 5 V/mu m. The emi ssion site density reached 10(7) cm(-2) at the same value of electric field . (C) 2000 American Vacuum Society. [S0734-211X(00)09602-5].