Thin film material of oriented multiwall carbon nanotubes was obtained by n
oncatalytical chemical vapor deposition in a glow-discharge plasma. The fil
m phase composition, surface morphology, and structural features were studi
ed by Raman and electron microscopy techniques. Low-voltage electron field
emission of thin film nanotube material was obtained and examined in diode
configuration. The I-V curves in Fowler-Nordheim coordinates were linear an
d the corresponding threshold average field was about 1.5 V/mu m. The emiss
ion current density was up to 50 mA/cm(2) at the field of 5 V/mu m. The emi
ssion site density reached 10(7) cm(-2) at the same value of electric field
. (C) 2000 American Vacuum Society. [S0734-211X(00)09602-5].