Nanoscale nonlinear optical process: theoretical modeling of second-harmonic generation for both forbidden and allowed light

Citation
Y. Jiang et al., Nanoscale nonlinear optical process: theoretical modeling of second-harmonic generation for both forbidden and allowed light, OPTICS LETT, 25(9), 2000, pp. 640-642
Citations number
12
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Optics & Acoustics
Journal title
OPTICS LETTERS
ISSN journal
01469592 → ACNP
Volume
25
Issue
9
Year of publication
2000
Pages
640 - 642
Database
ISI
SICI code
0146-9592(20000501)25:9<640:NNOPTM>2.0.ZU;2-5
Abstract
Based on a combination of the multiple-multipole method and nonlinear coupl ed-wave equations, a rigorous three-dimensional numerical simulation of non linear optical interactions between an optical near field and a nonlinear m edium is performed, allowing us to study the dependence of second-harmonic (SH) nearfield intensity on tip-sample distance and the polarization state of the incident fundamental wave. It is demonstrated that allowed and forbi dden Light make different contributions to the SH near-field intensity. (C) 2000 Optical Society of America.