Structural and morphological studies of Co/SiO2 discontinuous multilayers

This work aims to study the structural properties of Co-SiO2 discontinuous multilayers, obtained by magnetron sputtering. Such structure consisting of equally spaced planes of Co aggregates is embedded in a SiO2 matrix. Accor ding to the nanostructure, the size of the metallic aggregates and the mean distance between them, the magnetic and transport properties of the discon tinuous multilayers can be strongly modified. We used grazing incidence sma ll angle X-ray scattering technique (GISAXS) for the structural and morphol ogical characterisation of metallic aggregates in some selected multilayers , as a function of the metal thickness and annealing conditions after depos ition. GISAXS measurements were carried out at the ESRF on ID01 beamline. B elow the percolation threshold, we are able to determine the aggregate dens ity by this technique. The in-plane structure of the sample varies with the nominal thickness and annealing up to 400 degrees C seems to have a weak e ffect on the film characteristics. (C) 2000 Published by Elsevier Science B .V. All rights reserved.