Roughness in sputtered multilayers analyzed by transmission electron microscopy and X-ray diffuse scattering

Citation
At. Macrander et al., Roughness in sputtered multilayers analyzed by transmission electron microscopy and X-ray diffuse scattering, PHYSICA B, 283(1-3), 2000, pp. 157-161
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICA B
ISSN journal
09214526 → ACNP
Volume
283
Issue
1-3
Year of publication
2000
Pages
157 - 161
Database
ISI
SICI code
0921-4526(200006)283:1-3<157:RISMAB>2.0.ZU;2-P
Abstract
Sputtered W/C multilayers with a period of 25 Angstrom have been studied bo th by cross-section TEM and by X-ray diffuse scattering using 10 keV synchr otron radiation. Fitting to the X-ray data is aided by the TEM images in mo deling the roughness and roughness propagation within the Born approximatio n. We report on a study of the correctness of the often applied small rough ness approximation, and we find that is not well justified in the present c ase. In order to probe short lateral length scales at q(y) = 0.1 Angstrom(- 1), diffuse scattering data were obtained in an unconventional scattering g eometry. (C) 2000 Published by Elsevier Science B.V. All rights reserved.