Magnetic aftereffect (MAE) measurements in TixFe3-x-DeltaO4 with 0.01
less than or equal to x less than or equal to 0.4 (Delta approximate t
o 10(-4)) are performed by means of an oscillator technique in the tem
perature range 4 K < T < 460 K. The specific electronic MAE processes
below the Verwey temperature, i.e., tunnelling (4 K < T < 35 K) and lo
ng-range hopping (50 K < T < 125 K), are found to be severely affected
in the presence of even small Ti contents (0.01 less than or similar
to x less than or equal to 0.1). Above the Verwey temperature four mai
n processes are detected around 215 K (IV'), 260 K (IV), 300 K (III) a
nd 415 K (II). Atomistic models, based on the vacancy model for proces
s III in magnetite, are proposed in order to explain the observed spec
tra.