Thr atomic structure of the Si(112)7 X 1-In surface has been studied with s
canning tunneling microscopy (STM) and low-energy electron diffraction (LEE
D), and a model is proposed on the basis of the high resolution dual bias S
TM images and the systematic weakening of the LEED fractional-order beams,
for further investigation. In sharp contrast to what has been reported for
the Si(112)6 X 1-Ga surface, indium atoms in the Si(112)7 X 1-In surface do
not occupy the step-edge site.