Step bunching of vicinal GaN(0001) surfaces during molecular beam epitaxy

Citation
Mh. Xie et al., Step bunching of vicinal GaN(0001) surfaces during molecular beam epitaxy, PHYS REV B, 61(15), 2000, pp. 9983-9985
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
PHYSICAL REVIEW B
ISSN journal
10980121 → ACNP
Volume
61
Issue
15
Year of publication
2000
Pages
9983 - 9985
Database
ISI
SICI code
1098-0121(20000415)61:15<9983:SBOVGS>2.0.ZU;2-M
Abstract
Step bunching of vicinal GaN(0001) surface during epitaxial growth is obser ved by scanning tunneling microscopy. Large step stiffness and repulsive st ep-step interaction are suggested based on step morphology observations. Th e size of the bunch changes with time, depending on the direction in which the substrate is heated by a direct current. This observation provides evid ence for the electromigration effect causing the step bunching, and from th e field dependence we infer that adatoms, which are likely N, have effectiv e positive charges.