FERROMAGNETIC CHARACTERISTICS OF A PEROVSKITE-TYPE OF (LA, SR)MNO3 FILMS DEPOSITED BY KR SPUTTERING

La1-xSrxMnO3 films about 4000A thick were deposited by sputtering from the targets with composition of La0.76Sr0.24Mn0.78O3.0-y in the gas m ixture of Kr and O-2. Although the orientation of (110) in which metal lic ions are most closely packed was preferential for films deposited in the gas mixture of Ar and Oz, the orientation of (111) in which lar ge ions such as O2-, La3+ and Sr2+ are most closely packed was also ob served in the X-ray diffraction diagrams. The maximum saturation magne tization of the as-deposited films in Kr and O-2 was 0.17 kG and it in creased up to 2.4 kG for the film post-annealed at 1000 degrees C for 3 hours in oxygen atmosphere. This value was larger than that of the f ilm deposited in Ar and O-2 and annealed under the same condition. it seemed that the recoiled particles to the growing film surface and the atoms incorporated into the film were decreased in sputtering process by using Kr and therefore, larger 4 pi M-s was obtained.