T. Okuda et al., IN-SITU GROWTH OF POLYCRYSTALLINE BISMUTH-IRON-GARNET FILMS ON QUARTZGLASS SUBSTRATE, Journal de physique. IV, 7(C1), 1997, pp. 707-708
Polycrystalline (Bi,Gd),(Fe, Ga)(5)O-12 garnet layer was prepared on a
quartz glass substrate at 500 degrees C by alternating reactive ion b
eam sputtering using two ceramic targets, Gd3Ga5O12, and 3Bi(2)O(3)-5F
e(2)O(3). The lattice constant was 12.548 Angstrom. The layer was almo
st magnetically compensated and paramagnetic. On that layer, polycryst
alline Bi3Fe5O12 garnet layer was epitaxially grown by reactive ion be
am sputtering. Those two layers were successively deposited in the sam
e apparatus.