Enhancement of photoelastic constant of optical thin film waveguide assisted by surface acoustic wave

Citation
Y. Nakagawa et al., Enhancement of photoelastic constant of optical thin film waveguide assisted by surface acoustic wave, ULTRASONICS, 38(1-8), 2000, pp. 590-593
Citations number
2
Categorie Soggetti
Optics & Acoustics
Journal title
ULTRASONICS
ISSN journal
0041624X → ACNP
Volume
38
Issue
1-8
Year of publication
2000
Pages
590 - 593
Database
ISI
SICI code
0041-624X(200003)38:1-8<590:EOPCOO>2.0.ZU;2-H
Abstract
In the present research, we proposed a method of controlling the photoelast ic constant using surface acoustic waves, which had not previously been rep orted, and carried out experimental studies thereof. A Bragg diffraction wa s carried out to determine the photoelastic constants of Ta2O5. As a result , it is confirmed that the photoelastic constant of a Ta2O5 thin film under going a sputtering process, during which surface acoustic waves were excite d on the substrate, was about 2.19-2.27 times larger than those of thin fil ms on which surface acoustic waves were not excited. (C) 2000 Elsevier Scie nce B.V. All rights reserved.