Citation
R. Wochele et al., Tris (tris(trimethylsilyl)silyl) gallium, Ga{Si(Si(CH3)(3))(3)}(3), Z ANORG A C, 626(4), 2000, pp. 833-835
Citations number
25
Categorie Soggetti
Inorganic & Nuclear Chemistry
Journal title
ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE
ISSN journal
00442313
→ ACNP
Volume
626
Issue
4
Year of publication
2000
Pages
833 - 835
Database
ISI
SICI code
0044-2313(200004)626:4<833:T(GG>2.0.ZU;2-#
Abstract
The title compound has been prepared in good yield by the reaction of galli
um trichloride with base-free hypersilyl lithium (Li-Si(SiMe3)(3), Me = CH3
) in a 1:3 molar ratio. Ga(Si(SiMe3)(3))(3) is monomeric in solution and in
the solid state. The compound has been characterized with NMR, IR and Rama
n techniques as well as by an X-ray structure determination (planar GaSi3-s
keleton, monoclinic space group P2(1)/c, Z = 4, d(Ga-Si) = 249,8 +/- 0,2 pm
).