Plasma patterning of carbon nanotubes

Authors
Citation
Qd. Chen et Lm. Dai, Plasma patterning of carbon nanotubes, APPL PHYS L, 76(19), 2000, pp. 2719-2721
Citations number
17
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
19
Year of publication
2000
Pages
2719 - 2721
Database
ISI
SICI code
0003-6951(20000508)76:19<2719:PPOCN>2.0.ZU;2-T
Abstract
We have prepared micropatterns of carbon nanotubes on a wide range of subst rates either by patterned growth of aligned nanotubes on surfaces prepatter ned with plasma polymers (e.g., n-hexane plasma polymer) or through region- specific adsorption of certain chemically modified carbon nanotubes (e.g., -COOH substituted nanotubes) onto surfaces prepatterned with various plasma -generated functionalities (e.g., -NH2). Micropatterns of carbon nanotubes prepared in both cases have resolutions on a micrometer scale, suitable for fabrication of various electronic and photonic devices. (C) 2000 American Institute of Physics. [S0003-6951(00)04119-X].