Influence of epitaxial growth and substrate-induced defects on the breakdown of 4H-SiC Schottky diodes

Citation
Q. Wahab et al., Influence of epitaxial growth and substrate-induced defects on the breakdown of 4H-SiC Schottky diodes, APPL PHYS L, 76(19), 2000, pp. 2725-2727
Citations number
15
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
APPLIED PHYSICS LETTERS
ISSN journal
00036951 → ACNP
Volume
76
Issue
19
Year of publication
2000
Pages
2725 - 2727
Database
ISI
SICI code
0003-6951(20000508)76:19<2725:IOEGAS>2.0.ZU;2-F
Abstract
Morphological defects and elementary screw dislocations in 4H-SiC were stud ied by high voltage Ni Schottky diodes. Micropipes were found to severely l imit the performance of 4H-SiC power devices, whereas carrot-like defects d id not influence the value of breakdown voltage. The screw dislocation dens ity as determined by x-ray topography analysis under the active area of the diode was also found to directly affect the breakdown voltage. Only diodes with low density of screw dislocations and free from micropipes could bloc k 2 kV or higher. (C) 2000 American Institute of Physics. [S0003-6951(00)01 119-0].