An accurate simulation model of ion-exchange processes for fabricating chan
nel glass waveguides is presented. The simulation results are in good agree
ment with the experimental results because the simulation takes the concent
ration-dependent diffusion coefficient into account and applies the cubic-i
nterpolation pseudoparticle (CIP) method for electromigration which can tre
at a sharp interface with a few grids. The simulation is then used to study
optimum process conditions for a buried single-mode channel waveguide. It
is demonstrated that an annealing process following field-assisted ion-exch
ange is useful in reducing the coupling loss to a single-mode optical fiber
.