Reaction analysis of aluminum chemical vapor deposition from dimethyl-aluminum-hydride using tubular reactor and Fourier-transform infrared spectroscopy: Theoretical process optimization procedure (1)
M. Sugiyama et al., Reaction analysis of aluminum chemical vapor deposition from dimethyl-aluminum-hydride using tubular reactor and Fourier-transform infrared spectroscopy: Theoretical process optimization procedure (1), JPN J A P 1, 39(3A), 2000, pp. 1074-1079
Kinetic studies on the chemical vapor deposition (CVD) of aluminum from dim
ethylaluminumhydride (DMAH) were carried out to obtain the reaction model w
hich is useful for the process optimization. Fourier-transform infrared spe
ctroscopy (FT-IR) was used to monitor DMAH supplied to the reactor, which e
nsured the reliability of precursor delivery by the bubbling method. FT-IR
was also used to identify the reaction product of DMAH. Aluminum deposition
from DMAH yielded only trimethylaluminum (TMA). The analysis of aluminum d
eposition rate profile in the tubular reactor revealed that the rate limiti
ng step was the surface reaction of DMAH and that the surface reaction was
almost of the first order with respect to DMAH concentration. The analysis
took account of the monomer-dimer equilibrium of DMAH in the reactor whose
existence was suggested by quantum-chemical calculations. The activation en
ergy of approximately 80 kJ/mol was estimated from the relationship between
DMAH decomposition yield and the gas residence time in the tubular reactor
.