Effect of basic additives on acid-catalyzed electron-beam negative resist using intramolecular dehydration of phenylcarbinol

The effect of basic additives on a negative electron-beam resist utilizing acid-catalyzed intramolecular dehydration of 1,3,5-tris(2-(2-hydroxypropyl) )benzene (Triol) was investigated. Quinoline was selected as the most effec tive additive to suppress acid-diffusion among investigated ones. Though th e addition of quinoline decreased the Triol resist sensitivity, it enhanced the contrast and critical-dimension (CD) deviation stability to post-expos ure-baking temperature variation. Optimized resist system achieved the CD d eviation stability: 1.5 nm/degrees C and 100-nm line and space patterns wit h a dose of 6.2 mu C/cm(2) @ 50 kV. Influence of the additive on the Triol resist insolubilization mechanism was discussed.