Magnetization and FMR studies of crystal-ion-sliced narrow linewidth gallium-doped yttrium iron garnet

Citation
Fj. Rachford et al., Magnetization and FMR studies of crystal-ion-sliced narrow linewidth gallium-doped yttrium iron garnet, J APPL PHYS, 87(9), 2000, pp. 6253-6255
Citations number
3
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
3
Pages
6253 - 6255
Database
ISI
SICI code
0021-8979(20000501)87:9<6253:MAFSOC>2.0.ZU;2-3
Abstract
Recent interest in employing single-crystal yttrium iron garnet (YIG) films for miniaturized microwave integrated circuit applications has prompted us to study detaching liquid phase epitaxy (LPE) grown YIG films from their g adolinium gallium garnet (GGG) substrates via crystal ion slicing (CIS). We report studies of magnetization and ferromagnetic resonance (FMR) of narro w linewidth gallium-doped YIG (GaYIG) films in various stages of separation from their < 111 > oriented GGG substrates. All samples were diced from th e same three-inch wafer of Y3Fe4.6Ga0.4O12 with 4 pi M-eff of 1070 G and 9. 45 GHz FMR linewidth of 0.4 +/- 0.1 Oe. The CIS separation process involved (1) implantation with helium ions, (2) flash annealing to remove surface d amage, and (3) chemical etching to detach the YIG at the implantation damag ed layer. The starting films were 10.8-mu m thick. Separation occurred 7 to 8 mu m from the front surface in the YIG. The implantation (5x10(16) cm(-2 ) dosage, 3.8 MeV bias) increased the uniaxial anisotropy of these films. A small cubic anisotropy (similar to 5 G 60 degrees in-plane periodicity) pe rsisted in both implanted and unimplanted samples. Upon implantation the FM R linewidth increased from 0.4 to 3 +/- 0.5 Oe. The detached samples have l inewidths ranging from 1.7 to 2.5 Oe. The temperature dependence of the lin ewidths is roughly exponential decreasing as the temperature is lowered for the unprocessed sample, increasing with reduced temperature for all proces sed samples. Post-detachment annealing restores the FMR linewidth to 0.55 /- 0.5 Oe. (C) 2000 American Institute of Physics. [S0021-8979(00)76408-5].