Highly c-axis oriented Co95Cr5 films with perpendicular anisotropy were gro
wn epitaxially on Si (111), using an Ag seed layer, by physical vapor depos
ition. Films were characterized by x-ray diffraction, transmission electron
microscopy (TEM), selected area electron diffraction, and Lorentz microsco
py in a TEM. The following epitaxial relationship was confirmed: (111)(Si)p
arallel to(111)(Ag)parallel to(0001)(CoCr);[(2) over bar 20](Si)parallel to
[(2) over bar 20](Ag)parallel to[(1) over bar 100](CoCr). Magnetic domain s
tructures of these films were observed as a function of thickness; t, in th
e range, 200 Angstrom < t < 700 Angstrom using a wedge-shaped sample, and t
emperature-dependent measurements were carried out by in situ resistance he
ating. Thickness was measured locally by electron energy loss spectroscopy.
At room temperature, below a critical thickness, t(c)approximate to 300 An
gstrom, the magnetization was found to be effectively in-plane of the film,
and above t(c) a regular, stripe-like domain pattern with a significant, a
lternating in sign, perpendicular component was observed. The spin reorient
ation transitions of the stripe domains to the in-plane magnetization were
studied dynamically by observing the domains as a function of temperature b
y in situ heating up to 350 degrees C. The critical transition thickness, t
(c), which is a function of K-u and magnetostatic energy, was found to incr
ease with increasing temperature. The stripe-domain period, L observed at r
oom temperature was found to increase gradually with thickness; L=90 nm at
t=300 Angstrom, and L=110 nm at t=700 Angstrom. (C) 2000 American Institute
of Physics. [S0021-8979(00)46408-X].