Induced easy-axis reorientation in Ni/Pd multilayers upon Ar sputtering pressure

Citation
Jr. Jeong et Sc. Shin, Induced easy-axis reorientation in Ni/Pd multilayers upon Ar sputtering pressure, J APPL PHYS, 87(9), 2000, pp. 6851-6853
Citations number
20
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
3
Pages
6851 - 6853
Database
ISI
SICI code
0021-8979(20000501)87:9<6851:IERINM>2.0.ZU;2-H
Abstract
We have studied the easy-axis reorientation of Ni/Pd multilayer with varyin g Ar sputtering pressure. All the Ni/Pd multilayers prepared by dc-magnetro n sputtering at an Ar sputtering pressure of 2 mTorr show in-plane magnetic anisotropy. However, room-temperature perpendicular magnetic anisotropy wa s observed in Ni/Pd multilayers prepared at an Ar sputtering pressure of 7 mTorr. To understand the origin of the easy-axis reorientation from in-plan e to out-of-plane with varying the sputtering pressure, the magnetoelastic anisotropy was quantitatively determined from delicate in situ stress and e x situ magnetostriction coefficient measurements. We have found that the ob served easy-axis reorientation was ascribed to the enhancements of the surf ace anisotropy as well as the magnetoelastic anisotropy with increasing Ar sputtering pressure. (C) 2000 American Institute of Physics. [S0021-8979(00 )89208-7].