N. Inaba et M. Futamoto, Effects of Pt and Ta addition on compositional microstructure of CoCr-alloy thin film media, J APPL PHYS, 87(9), 2000, pp. 6863-6865
Compositional segregation structures of Co-Cr-Ta, Co-Cr-Pt, and Co-Cr-Pt-Ta
thin film media with Cr concentrations of about 15 at. % were studied usin
g an analytical transmission electron microscope. Cr atoms in the CoCrTa sp
ecimen are extremely localized around the grain boundaries with a maximum c
oncentration of about 23 at. % with a width of 1 nm, while that inside the
grain is about a half of the average composition. The Co-Cr-Pt specimen sho
ws Cr segregation at grain boundaries with a maximum concentration by 4 at.
% greater than the average composition. The Cr concentration inside the gr
ain is kept nearly same with the average concentration. The Co-Cr-Pt-Ta spe
cimen shows a degree of Cr segregation between the Co-Cr-Ta and the Co-Cr-P
t systems. The Cr enrichment at bicrystal grain boundaries is broader and w
eaker than those at the normal grain boundaries. (C) 2000 American Institut
e of Physics. [S0021-8979(00)69708-6].