Effect of chromium addition on the properties of sputtered strontium ferrite films

Citation
A. Morisako et al., Effect of chromium addition on the properties of sputtered strontium ferrite films, J APPL PHYS, 87(9), 2000, pp. 6872-6874
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
3
Pages
6872 - 6874
Database
ISI
SICI code
0021-8979(20000501)87:9<6872:EOCAOT>2.0.ZU;2-1
Abstract
Hexagonal strontium ferrite (SrM) thin films with various Cr composition in the range of 0-36 at. % were sputtered on the thermally oxidized silicon w afers at the substrate temperature of 550 degrees C using targets of compos ition of SrFe8Ox. It was found that the SrM grows with its c axis oriented perpendicularly to the film plane and its c-axis orientation was improved b y Cr addition in the range of 9-36 at. %. The saturation magnetization and coercivity in the perpendicular direction were about 150 emu/cm(3) and 2.8 kOe, respectively for 9 at. % of Cr addition. The grain size observed at th e surface was 80 nm and the surface roughness was 11 nm. (C) 2000 American Institute of Physics. [S0021-8979(00)94308-1].