S. Bae et al., Bottom giant magnetoresistance spin valves using a radio frequency reactive bias-sputtered alpha-Fe2O3 antiferromagnetic layer, J APPL PHYS, 87(9), 2000, pp. 6980-6982
The giant magnetoresistance (GMR) characteristics were investigated for rf
reactive bias-sputtered alpha-Fe2O3(50 nm) based bottom spin-valve structur
es. The GMR ratio of this structure was found to be affected by Cu interlay
er thickness. When the Cu interlayer thickness was changed from 1.6 to 3.1
nm, the GMR ratio varied from 14.2%(t(cu)=1.8 nm) to 8.3%(t(cu)=3.1 nm). Th
e MR sensitivity and MR ratio dependence were studied for Si/alpha-Fe2O3(50
nm)/(NiFe, or Co)/Cu(2.3 nm)/(NiFe, or Co) structures. The MR ratio of NiF
e(5.0%) based spin valve was much smaller than that of Co(16.1%), but it (0
.6%/Oe) showed much higher MR sensitivity than that of Co(0.3%/Oe). The alp
ha-Fe2O3 input sputtering power was also changed from 600 to 1000 W for Si/
alpha-Fe2O3(50 nm)/Co(or NiFe)/Cu(2.3 nm)/Co(or NiFe) structures. With incr
easing input power, the MR ratio increased for both Co (up to 15%) and NiFe
(up to 3.1%). The main reason for the increase of MR ratio was attributed
to the smoother surface. The average surface roughness measured by ex-situ
AFM had 1.38 nm (600 W), 0.9 nm (800 W), and 0.87 nm (1000 W), respectively
. (C) 2000 American Institute of Physics. [S0021-8979(00)44208-8].