Giant magnetostrictive thin films for applications in microelectromechanical systems (invited)

Citation
A. Ludwig et E. Quandt, Giant magnetostrictive thin films for applications in microelectromechanical systems (invited), J APPL PHYS, 87(9), 2000, pp. 4691-4695
Citations number
26
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
2
Pages
4691 - 4695
Database
ISI
SICI code
0021-8979(20000501)87:9<4691:GMTFFA>2.0.ZU;2-5
Abstract
Sputter-deposited giant magnetostrictive thin films allow the realization o f microactuators and sensors which can be addressed by remote control opera tion. Applications reviewed in this article are in the field of microelectr omechanical systems (MEMS), e.g., microfluidic devices, micromotors, laser scanner mirrors etc. In general, all these MEMS applications of magnetostri ctive thin films require a well defined uniaxial in-plane anisotropy and ar e operated at or above room temperature. In previous investigations it was found that (Tb40Fe60/Fe50Co50) multilayers represent the most promising thi n film material with respect to their unique combination of soft magnetic a nd giant magnetostrictive properties. Consequently, this material was used to show the possibility to control the orientation of the magnetic easy axi s by magnetic field annealing. Furthermore data about the temperature depen dence of these magnetostrictive films are given. (C) 2000 American Institut e of Physics. [S0021-8979(00)20308-3].