Exchange biasing in sputtered NiFe/PtMn bilayers

Citation
Hw. Xi et al., Exchange biasing in sputtered NiFe/PtMn bilayers, J APPL PHYS, 87(9), 2000, pp. 4918-4920
Citations number
23
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
2
Pages
4918 - 4920
Database
ISI
SICI code
0021-8979(20000501)87:9<4918:EBISNB>2.0.ZU;2-F
Abstract
The exchange coupling between ferromagnetic Ni81Fe19 and antiferromagnetic (AF) PtxMn1-x films prepared by rf and dc magnetron sputtering has been inv estigated. The Pt content in the PtxMn1-x film is in the range of 0 at. %< x < 20 at. %. The exchange field and coercivity were found to depend strong ly on the deposition conditions and the AF film composition. X-ray diffract ion measurements and transmission electron microscopy measurement showed a gamma-PtMn phase with a disordered fcc structure when the PtxMn1-x was depo sited on top of the Ni81Fe19 layer. The exchange bias was found to depend o n the texture and film composition of the gamma-PtMn layers. (C) 2000 Ameri can Institute of Physics. [S0021-8979(00)35608-0].