K. Yagami et al., Magnetic anisotropy in antiferromagnetic layers affecting exchange bias ofNi-Fe/Mn-Ir bilayers, J APPL PHYS, 87(9), 2000, pp. 4930-4932
The magnetic anisotropy of antiferromagnetic layers (K-AF) was estimated fo
r Ni-Fe 50 Angstrom/Mn-Ir d(AF) bilayers using Mauri's method (d(AF)(cr)=J(
K)(s)/K-AF), where J(K)(s) is the saturation value of the unidirectional an
isotropy constant (J(K)). The critical thickness of the antiferromagnetic l
ayers (d(AF)(cr)), at which J(K) took half the value of J(K)(s), was determ
ined from the dependence of J(K) on d(AF). The d(AF)(cr) was found to be al
most constant (35 +/- 2 Angstrom) independent of J(K)(s). Thus, the relatio
n of J(K)(s)proportional to K-AF was derived, suggesting that the variation
in J(K)(s) is due to a change in the value of K-AF. J(K)(s), however, was
found to vary considerably for various Mn-Ir films possessing an almost ide
ntical Ir content, and thus probably the same value of K-AF. In addition, s
tudies by x-ray diffraction, transmission electron microscopy, and electron
diffraction revealed that the change in J(K)(s) was independent of the mic
rostructure and phase of the antiferromagnetic (AF) Mn-Ir films, both of wh
ich control K-AF. Thus, J(K)(s) was found to be independent of K-AF contrad
icting the relation, J(K)(s)proportional to K-AF. This contradiction result
s from the assumption by Mauri that the coupling energy (J) is equal to J(K
)(s) even in the polycrystalline exchange-coupled bilayers. A model that to
ok account of the distribution of K-AF axes of AF grains in the plane of th
e AF film successfully explained the behavior of J(K). J(K)(s) was found to
change independent of both J and K-AF, and furthermore, it has been shown
that the dependence of J(K)(s) on the sputtering conditions for Mn-Ir films
is probably due to the effective temperature of the films during depositio
n. (C) 2000 American Institute of Physics. [S0021-8979(00)35908-4].