Monodomain configurations due to bias effect in NiO/NiFe microstructures

Citation
Jc. Wu et al., Monodomain configurations due to bias effect in NiO/NiFe microstructures, J APPL PHYS, 87(9), 2000, pp. 4948-4950
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
2
Pages
4948 - 4950
Database
ISI
SICI code
0021-8979(20000501)87:9<4948:MCDTBE>2.0.ZU;2-0
Abstract
Magnetic domain configurations of microstructured permalloy exchange couple d by an antiferromagnetic (NiO) thin film is presented. NiO/NiFe bilayer mi crometer array elements were fabricated using electron beam lithography thr ough a lift-off technique. The magnetic force microscopy images of the elli ptical and rectangular elements with various aspect ratios showed dipole-li ke magnetic domain structures. The bright/dark arc contrast associated with the magnetic pole strength was dependent on the anisotropic exchange field . Furthermore, the shape anisotropy can overwhelm anisotropic exchange in p atterned elements with a high aspect ratio and thicker permalloy film. (C) 2000 American Institute of Physics. [S0021-8979(00)82708-5].