Metal ion implantation using a filtered cathodic vacuum arc

When plasma immersion ion implantation is performed in the condensable plas ma stream produced by a cathodic vacuum arc, deposition as well as implanta tion usually occurs. In this article we describe a method of achieving pure implantation by orienting the substrate so that it is shadowed from the pl asma beam. Implantation depth profiles measured in glassy carbon and CR39 p olymer using Rutherford backscattering are compared to illustrate the effec tiveness of the technique for conducting and insulating substrates. Chargin g of the insulating substrate was found to cause a reduction in implantatio n depth compared to a conducting substrate. The depth profiles in glassy ca rbon were comparable to those achieved by conventional extracted ion beam i mplantation. Implantation of magnesium into hydroxyapatite and alumina was carried out to improve the bone cell adhesion onto these materials for pros thetic applications. (C) 2000 American Institute of Physics. [S0021-8979(00 )05004-0].