P. Riess et al., Stress-induced leakage current generation kinetics based on anode hole injection and hole dispersive transport, J APPL PHYS, 87(9), 2000, pp. 4626-4628
An approach giving a physical understanding of the stress-induced leakage c
urrent (SILC) generation kinetics based on anode hole injection and hole di
spersive transport in the oxide is presented. It is shown that the SILC is
not directly correlated to the defects responsible for oxide breakdown. How
ever, it is suggested that trapped holes can impact on the defect creation
rate and, in turn, on the breakdown generation. (C) 2000 American Institute
of Physics. [S0021-8979(00)02909-1].