Stress-induced leakage current generation kinetics based on anode hole injection and hole dispersive transport

Citation
P. Riess et al., Stress-induced leakage current generation kinetics based on anode hole injection and hole dispersive transport, J APPL PHYS, 87(9), 2000, pp. 4626-4628
Citations number
10
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
1
Pages
4626 - 4628
Database
ISI
SICI code
0021-8979(20000501)87:9<4626:SLCGKB>2.0.ZU;2-I
Abstract
An approach giving a physical understanding of the stress-induced leakage c urrent (SILC) generation kinetics based on anode hole injection and hole di spersive transport in the oxide is presented. It is shown that the SILC is not directly correlated to the defects responsible for oxide breakdown. How ever, it is suggested that trapped holes can impact on the defect creation rate and, in turn, on the breakdown generation. (C) 2000 American Institute of Physics. [S0021-8979(00)02909-1].