Response to "Comment on 'Hydrogen-oxygen interaction in silicon at around 50 degrees C' [J. Appl. Phys. 87, 4635 (2000)]

Citation
Vp. Markevich et M. Suezawa, Response to "Comment on 'Hydrogen-oxygen interaction in silicon at around 50 degrees C' [J. Appl. Phys. 87, 4635 (2000)], J APPL PHYS, 87(9), 2000, pp. 4637-4637
Citations number
7
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF APPLIED PHYSICS
ISSN journal
00218979 → ACNP
Volume
87
Issue
9
Year of publication
2000
Part
1
Pages
4637 - 4637
Database
ISI
SICI code
0021-8979(20000501)87:9<4637:RT"O'I>2.0.ZU;2-F