A. Ulyanenkov et al., X-ray scattering study of interfacial roughness correlation in Mo/Si multilayers fabricated by ion beam sputtering, J APPL PHYS, 87(10), 2000, pp. 7255-7260
Specular and diffuse x-ray scattering are used to probe the mesoscopic stru
cture of interfaces within two 30-period Mo/Si superlattices, grown on sili
con and glass substrates by ion beam sputtering. The data are evaluated qua
litatively and quantitatively on the basis of a distorted-wave Born approxi
mation, which includes a correlating behavior of interface roughness in bot
h the lateral and vertical directions. Different initial conditions of the
substrate's surface result in distinguishable characters of roughness repli
cations in the direction of growth. The average value, lateral correlation
and fractal dimension of roughness are found to be different in the two sam
ples, which leads to differences in the reflective properties of multilayer
mirrors. (C) 2000 American Institute of Physics. [S0021-8979(00)05810-2].