S. Bhattacharyya et al., Structure of nitrogenated carbon films prepared from acetylene and nitrogen mixture in electron cyclotron resonance plasma, J APPL PHYS, 87(10), 2000, pp. 7524-7532
Amorphous nitrogenated carbon (a-CNx) films have been prepared from a mixtu
re of acetylene and nitrogen gas in an electron cyclotron resonance plasma
and characterized by electron energy-loss spectroscopy (EELS), spectroscopi
c ellipsometry (SE), Fourier transformed infrared (FTIR) spectroscopy, Rama
n spectroscopy, x-ray photoelectron spectroscopy, and ultraviolet photoelec
tron spectroscopy. From EELS and SE, a significant change in the pi plasmon
peak position and a reduction of its area is observed in the carbon films
after nitrogen introduction, which suggest that there is no further develop
ment of graphitic structure. The features of D and G peaks observed from Ra
man as well as FTIR spectra support a decrease in the amount of sp(2) bonde
d carbon in the a-CNx films. Valence band spectra using He I and He II exci
tations show that the p-pi band becomes less intense upon nitrogen addition
. A comparative study between the characteristics of these films and the fi
lms deposited from a methane-nitrogen mixture using an identical procedure
is also presented. It is found that the structural changes in these films u
pon nitrogen incorporation are different, indicating a definite role of the
precursors on the film structure. (C) 2000 American Institute of Physics.
[S0021-8979(00)04809-X].