Highly conductive Nb doped SrTiO3 epitaxial thin films grown by laser molecular beam epitaxy

Citation
T. Zhao et al., Highly conductive Nb doped SrTiO3 epitaxial thin films grown by laser molecular beam epitaxy, J CRYST GR, 212(3-4), 2000, pp. 451-455
Citations number
12
Categorie Soggetti
Physical Chemistry/Chemical Physics
Journal title
JOURNAL OF CRYSTAL GROWTH
ISSN journal
00220248 → ACNP
Volume
212
Issue
3-4
Year of publication
2000
Pages
451 - 455
Database
ISI
SICI code
0022-0248(200005)212:3-4<451:HCNDSE>2.0.ZU;2-K
Abstract
Highly conductive Nb doped SrTiO3 (Nb:STO) thin films with good crystallini ty and smooth surfaces were epitaxially grown on SrTiO3 (STO) (1 0 0) subst rates by laser molecular beam epitaxy. The resistivity, carrier concentrati on and mobility of the Nb:STO thin film are 3.6 x 10(-4) Omega cm, 2.8 x 10 (21) cm(-3) and 12.7 cm(2)/V s, respectively, which are the best values in Nb:STO thin films reported so far. The root-mean-square surface roughness o f the deposited thin him is measured to be 0.240 nm by atomic force microsc opy. The chemical composition and its uniform distribution in the film were confirmed by angle-resolved X-ray photoelectron spectroscopy and Rutherfor d backscattering spectrometry. The difference of electronic structure in th e band gap region between Nb : STO and STO thin films was studied by X-ray photoelectron spectroscopy. (C) 2000 Elsevier Science B.V. All rights reser ved.