Ductility and stress relaxation kinetics in a silicon nitride ceramic in the 1400-1650 degrees C range

Authors
Testu, S Besson, JL Rouxel, T Bernard-Granger, G
Citation
S. Testu et al., Ductility and stress relaxation kinetics in a silicon nitride ceramic in the 1400-1650 degrees C range, J MAT SCI L, 19(11), 2000, pp. 1007-1010
Citations number
13
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science","Material Science & Engineering
Journal title
JOURNAL OF MATERIALS SCIENCE LETTERS
ISSN journal
02618028 → ACNP
Volume
19
Issue
11
Year of publication
2000
Pages
1007 - 1010
Database
ISI
SICI code
0261-8028(200006)19:11<1007:DASRKI>2.0.ZU;2-Y