Effects of heat treatment on amorphous carbon nitride prepared by reactivemagnetron sputtering

Citation
Xc. Xiao et al., Effects of heat treatment on amorphous carbon nitride prepared by reactivemagnetron sputtering, J PHYS CH S, 61(6), 2000, pp. 915-917
Citations number
8
Categorie Soggetti
Apllied Physucs/Condensed Matter/Materiales Science
Journal title
JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
ISSN journal
00223697 → ACNP
Volume
61
Issue
6
Year of publication
2000
Pages
915 - 917
Database
ISI
SICI code
0022-3697(200006)61:6<915:EOHTOA>2.0.ZU;2-Z
Abstract
The amorphous CNx powders were prepared by reactive DC magnetron sputtering . Based on the DTA-TG analysis, a characteristic temperature (1440 degrees C) was determined at which heat treatment was employed to crystallize the a morphous powders. Subsequent structural and compositional analysis were car ried out on the heat-treated samples by using XRD, scanning Auger. The powd er diffraction pattern revealed that alpha-C3N4 is the main crystalline the rmodynamically stable phase in the predicted crystalline carbon nitrides. N ano crystallites were observed with compositions very close to that of the C3N4 crystal. (C) 2000 Elsevier Science Ltd. All rights reserved.