We present experimental data on InAs epitaxial layers grown on (N11)GaAs su
bstrates showing that the substrate orientation affects the critical thickn
ess for the onset of quantum dot self-assembling. The samples under investi
gation were characterised via photoluminescence measurements. We observed a
decrease of self-assembling critical coverage with increasing Miller index
N of the substrate. The observed behaviour is induced in-island strain rel
axation inhibition caused by the use of high index substrates for the growt
h. (C) 2000 Elsevier Science S.A. All rights reserved.