Electron backscattering from real and in-situ treated surfaces

Citation
L. Frank et al., Electron backscattering from real and in-situ treated surfaces, MIKROCH ACT, 132(2-4), 2000, pp. 179-188
Citations number
18
Categorie Soggetti
Spectroscopy /Instrumentation/Analytical Sciences
Journal title
MIKROCHIMICA ACTA
ISSN journal
00263672 → ACNP
Volume
132
Issue
2-4
Year of publication
2000
Pages
179 - 188
Database
ISI
SICI code
0026-3672(2000)132:2-4<179:EBFRAI>2.0.ZU;2-L
Abstract
Significant differences in backscattered electron (BSE) yields exist betwee n the surfaces cleaned by methods used in electron microscopy and spectrosc opy. These differences have been observed for Au, Cu and Al specimens, and are interpreted on the basis of simulated BSE yields. Composition and thick ness of the surface contamination layers, responsible for the differences, are estimated. The results (7 nm of carbon on Au or 3 nm of oxide on Al) re main within expectation and indicate that the BSE yield measurements and BS E images should be interpreted cautiously. Peculiar results are obtained fo r Cu, perhaps due to a different cleaning procedure, A new concept of an in formation depth for the BSE signal is introduced as a depth within which th e total BSE yield can be modelled as composed of the yields of layers propo rtional to their. thickness weighted by the escape depths. This concept pro ved satisfactory for thin surface layers and brought the information depth values 2 to 4 times smaller than first estimated, i.e. half the penetration depth.